C7460 [HAMAMATSU]

Multiband Plasma-Process Monitor; 多波段等离子工艺监控


型号：	C7460
厂家：	HAMAMATSU CORPORATION
描述：	Multiband Plasma-Process Monitor 多波段等离子工艺监控监控
文件：	总8页 (文件大小：525K)
中文：	中文翻译
下载：	下载PDF数据表文档文件

Multiband Plasma-Process Monitor

Model C7460

The Multiband Plasma-Process Monitor

ꢀ Simultaneous measurement

(MPM) is a system specifically designed for

from 200 to 950 nm

monitoring the optical plasma emissions that

ꢀ Easy measurement using

are created during the various manufacturing

optical fiber input

processes of semiconductors including

ꢀ

High levels of accuracy and

reliability

etching, sputtering, cleaning, and CVD.

The MPM can handle multi-channel recording

in real-time.

Software for measurement,

analysis and factory integration

Real-Time Plasma Monitoring

BACKGROUND

Up to 60 percent of the time that a piece of semi-

conductor manufacturing equipment spends in oper-

ation is generally for non productive jobs like plas-

ma cleanup, chamber stabilization (seasoning) and

system diagnosis. Typical approaches for reducing

down-time and repetitive processes like these are to

utilize Advanced Process Control (APC) and Sensor

Based Process Control (SBPC) technologies with

factory LAN services. The MPM allows you to gain

full control over processes using information provi-

ded by the MPM regarding plasma spectra, etching

end-point detection status, plasma fault status, etc.

The MPM opens the possibility of significantly in-

CONFIGURATION OFAPC WITH MPM (EXAMPLE)

creasing the efficiency of manufacturing equipment.

FEATURES

Ethernet

HUB

Ethernet

ꢀ Highly Accurate and Reliable

The MPM employs a high-resolution compact spec-

Optical fiber

trograph and a highly sensitive detector which diag-

nose plasma with elevated levels of precision.

Along with these superior photometric characteris-

tics, the MPM is compact, sturdy and offers the high

standards of reliability that are required in a manu-

facturing environment.

MPM

C7460

POWER

RS-232C

C7460

POWER

RS-232C

C7460

POWER

RS-232C

C7460

POWER

RS-232C

ꢀ Easy to Operate

The MPM is equipped with a sturdy fiber optic bun-

dle, which can conveniently be combined with the

plasma chamber. Due to this, and due to its easy-to

use software, the MPM is easy to setup and operate.

Script output (end point, plasma fault status, etc)

ꢀ Intelligent Sensor System

The MPM is not just a spectrograph. It also contains in-

ternal data processing capabilities which allow to ex-

tract and compress the relevant infomation from the

data.

ꢀ Easy Fab Integration

The MPM is equipped with several interfaces in-

cluding Ethernet and a TCP/IP protocol stack. To-

gether with its very verstile software framework this

allows the easy integration into existing fab IT infra-

structure.

STANDARD CONFIGURATION

MPM Standard Configuration

C7460

POWER

Ethernet (TCP/IP)

RS-232C

Main unit

Computer

Fiber input optics

U9046 Plasma Process Data Aquisition Software

Windows 98, NT, 2000

Simultaneous Measurement

from 200 nm to 950nm

BENEFITS (EXAMPLES)

ꢀ Easy Plasma Status Settings

Real-time monitoring of the plasma process supports easy to

make settings for the volume of introduced gas and plasma power.

Product yield is increased through improved processing stability,

and the early discovery of abnormalities.

ꢀ Advanced Endpoint Detection

Powerful scripts can be defined as recipes for each endpoint

detection. It is possible to use the information in the whole

spectrum by means of the unique spectral patterns method.

This allows for advanced endpoint control with unprecedented

specificity and precision.

ꢀ Higher Efficiency through Automatic Cleaning Control

APPLICATIONS OVERVIEW

Particularly with CVD, in which the chamber must be cleaned

each time a wafer is processed, cleaning time has a major effect

on actual operating efficiency. The automatic control features

greatly improved throughput, increased productivity, and reduced

costs.

Due to the high versatility of the hardware and the soft-

ware framework, the MPM is suitable for various different

applications, without any compromise in performance or

convenience. These applications can be grouped into the

following categories:

ꢀ Monitoring of Impurities and Abnormal Discharges

Monitoring of the emission band, which does not occur in normal

processes, provides warning of impurities and abnormal dis-

charges before they occur, and thus improves yield.

ꢀ Engineering Tasks

Such as process optimization, comparison and matching;

trouble-shooting; etc.

ꢀ Endpoint Control

Advanced, highly specific and sensitive end point control.

ꢀ Fault Detection

Highly selective automatic fault detection.

ꢀ APC Sensor

Automatic extraction of highly specific APC key numbers.

(Under development)

ꢀ3-d display of plasma emission of CVD Cleaning (C4F, O2, Ar) of SiN

SYSTEM STRUCTURE

Network

Plasma equipment

EPD signal

Driver Software

control

process data

Plasma

Emission

control

U9046

Plasma Process

Data Acquisition Software

MPM(C7460)

(Hardware)

spectrum

data

formula for

end-point detection

Standard

Optional

Database

spectrum data

with process data

U8851

End-point Synthesis Tool

Easy Measurement using Optical Fiber

FUNCTIONS OF HARDWARE

ꢀ Measurement Parameter Setting

• Measurement interval

• Exposure time: 20 to 32767 ms

• Data accumulation: 1 to 32767 spectra

• Sensor sensitivity: 3 settings (1x, 2x, 5x)

• Wavelength smoothing: on/off

• Width for wavelength smoothing: any integer value within 1 to 50 nm

• Time smoothing (rolling average): on/off

• Filter for time smoothing: any value within 0 to 100 %

• Trigger : measurement start trigger

ꢀ Measurement Script

Scripts contain measurement conditions as well as formula and

judgments applied to the data. Results of script processing can be

output via the software and via the analog BNC terminal in real-

time. Each etch process will be treated by a tailored script.

The maximum number of scripts the MPM can store internally is

100, and one of them is selected as the active one. Each script can

contain the definition of up to 32 formulas. All script processing is

perfomed inside the MPM and in real-time.

SPECIFICATIONS

Bundle diameter inner: 1 mm; outer: 7 mm

Fiber input optics

Fiber aperture (N.A.) 0.2

Bundle length 3 m

200 to 950 nm (Measuring range)

235 to 950 nm (Sensitivity-corrected range)

< 2 nm

16 bit

ꢀ Script Formula

Script fomula can be defined to perform math operations between

spectral intensities. Besides the four basic algebraic functions, it is

also possible to compute smoothing, differentials as well as the

special spectral patterns applied for endpoint and fault detection

(see section on U8851 in this brochure).

Wavelength range

Wavelength resolution

A/D resolution

2 outputs

BNC; 0 to 10 V

Analog signal output result

of formula calculation

ꢀ Judgments

Judgments are used to detect endpoint or fault conditions. They

are defined by thresholds applied to formula, and they can be

chained and combined by logical operators.

Script output result of

judgment calculation

Busy output

5 outputs (3 outputs for External Trigger)

BNC; TTL; High impedance

Start input

BNC; TTL; High impedance; pulse width: min. 40 ms

IEEE 802.3 (10BaseT); 10 Mbit/s

RJ45 modular connector

Ethernet

Interfaces

RS-232

Serial

Interface protocol

Line voltage

TCP/IP (for Ethernet only)

AC 100 / 117 / 220 / 240 V ± 10%; 50 / 60 Hz

90 VA

Power consumption

DIMENSIONAL OUTLINE (Unit: mm)

Fiber Input Optics (weight: approx.100g)

ꢀ

Main Unit (weight: approx.7kg)

ꢀ

3000

C7460

POWER

RS-232C

0.95

3±0.5

325±1

383±1

Input side

To main unit

200±1

262±1

25±1

Plasma Process Data Acquisition Software

Standard Software

U9046

SOFTWARE ARCHITECTURE

Drivers

Watchdog

Communication Layer

Control Station

Logging

Database

MPM C7460

U9046 consists of several software components to perform the

measurement in real time with great flexibility.

OUTLINE

ꢀ Control Station

Control Station allows to control C7460s and observe the

spectrum data. The measurement can be triggered by the trigger

signal from the plasma chamber and also by the optical trigger.

The measurement can be repeated automatically during the

several wafers' process.

The U9046 is a software which allows to control up to 4 units

of C7460 multiband plasma process monitor simultaneously

and observe the spectrum of plasma emission during plasma

processes. The observed spectrum data are stored in the

database automatically and can be analyzed. The highly

sensitive end-point detection software U8851 is an option. And

also the fault detection software for Advanced Process Control

will be available.

ꢀ

Database

The spectrum data observed by the Control Station are stored into

the SQL compatible Database.

ꢀ Watchdog

The Watchdog software component always monitors the condition

of the software, and an error will be reported by an e-mail.

FEATURES

ꢀ

Logging

The Logging component records the history of the software jobs in

a file.

ꢀ

Up to 4 units of C7460 can be controlled simultaneously,

and all of the spectrum data during plasma process can be

observed.

Drivers for the Plasma Chambers

The Drivers software can be provided to make communication to

the plasma chambers or factory network. The Drivers can obtain

the information about the process like Process ID and Lot No. and

so on. Such information can be stored with the observed spectrum

data into the Database. Such a driver is needed typically for

endpoint and automatic fault detection installations.

ꢀ

Database oriented data storage is available and a fast SQL

based data access is allowed.

The various ways to trigger the measurement are prepared.

ꢀ

Easy Graphical User Interfaces

The drivers to communicate to the plasma chambers or

factory network can be optionally provided.

The graphical user interfaces (GUIs) used by the process

engineer and by the operators are different and dedicated to their

respective tasks. Specifically, the operators' GUI is very easy to

use, minimizing the risk of human errors.

End-point Synthesis Tool U8851

End-point Synthe_Osi_ps_tioT_no_ao_ll_SoU_f8_tw8_a5_re1

Optional Software

FEATURES

ꢀ End-point detection in small aperture process

ꢀꢀSimultaneous analysis of several wafers

ꢀꢀStability evaluation of a process

OPERATIONAL OUTLINE

Fig. 2 Analysis pattern

ꢀꢀMeasurement data D (λ,t)

D (l, t) = Average spectrum + S1 (l) × T1 (t) + S2 (l)× T2 (t) + S3 (l) × T3 (t)

OUTLINE

The U8851 is an optional software application that is utilized

with the Multiband Plasma-Process Monitor C7460 for end-

point detection in plasma etching.

With the U8851, highly sensitive end-point detection of the

conventionally difficult small aperture process has been

made possible.

T1 (t)

(

)

In addition, since the process data of several wafers can be

analyzed simultaneously, the reliability of the operation

formula that performs an end-point detection is improved,

the verification of an end-point detection is performed easily,

and the stability evaluation of a process can be performed as

well.

COMPARISON

S2 (λ)

T2 (t)

Conventional method

U8851

T3 (t)

S3 (λ)

End point

Fig. 1 Comparison of U8851 with conventional method

An example of an end-point detection of oxidization film

etching (1% or less of aperture ratio) is shown in Fig. 1.

Although it was difficult to detect the end-point of a process

from the time changes in spectrum intensity by using the

conventional method, detection with sufficient accuracy is

possible with the U8851.

End-point Synthesis Tool U8851

End-point Synthe_Osi_ps_tioT_no_ao_ll_SoU_f8_tw8_a5_re1

Optional Software

Fig. 3 Example of an analysis display

1The data recorded by the Multiband Plasma-Process Monitor

C7460 of the changes in the passage of time of the spectrum is

loaded onto the End-point Synthesis Tool U8851.

2With the analysis function of the U8851, the spectrum data,

which constantly changes, analyzes what kinds of spectrum

patterns are shown by addition, and how each spectrum pattern

is carrying out time changes.

In Fig. 1 the measured data D (l, t) shows that three spectrum

patterns (S1 [l] to S3 [l]) are mainly shown with the superposition

of data which carried out time changes like T1 (t) to T3 (t),

respectively focusing on the average spectrum.

(a)

(b)

3The U8851 can perform end-point detection of a process from

spectrum pattern changes obtained in the analysis of 2 with

changes in the passage of time.

(c)

It specifies which spectrum pattern can be utilized for end-point

detection with changes in the passage of time and smoothes and

differentiates waveforms according to changes in the passage of

time to detect an end-point.

(a) : An operation formula is set up.

(b) : An operation result is displayed.

Moreover, analysis of 2 and 3 can be simultaneously

performed on two or more wafers, and the detected end-point

time is displayed on a graph.

While verifying an end-point detection with these functions, the

stability of a process can also be evaluated. (Fig.3)

4The detection operation formula of the acquired end points as

mentioned above, can be saved in a file and downloaded into the

C7460 as well.

In the C7460, end-point detection like in 3 is performed in real

time.

Optical Attenuator C8066

Optical Atte_On_pu_tia_ot_no_alr_HC_ar8_d0_w6_ar6_e

Optional Hardware

OUTLINE

The C8066 is an optical attenuator for the Multiband Plasma-

Process Monitor C7460. It is possible to change the light

intensity in five steps (1, 1/10, 1/100, 1/1000, 1/10000) by the

button on the front panel or via RS-232C interface.

The optimum light intensity for monitoring the plasma

emission can thus be obtained.

Optical Attenuator C8066

Optical Atte_On_pu_tia_ot_no_alr_HC_ar8_d0_w6_ar6_e

Optional Hardware

SPECIFICATIONS

FEATURES

ꢀ

Light Intensity Change in Five Steps

With attenuated filter, the light intensity can be changed in

five steps (1 to 1/10000).

Functions/

1, 1/10, 1/100, 1/1000, 1/10000

200nm to 1000nm

Remote operation /Local operation

Attenuated ratio

Wavelength region

Operation

Performance

RS-232C

ꢀ

High-speed and Highly Precise Changing

Filter changing time

Baud rate

0.2sec/STEP

38400bps

8bit

The stepping motor is adopted and a high-speed and

highly precise filter change of 0.2 s / step is possible.

Data bit

Parity

None

1bit

D-sub 9pin

ꢀ

Easy Operation

Stop bit

The filter can be easily changed via a button on the front

panel, or via RS-232C interface.

Connector

Line voltage

AC100 to 120V / 220 to 240V , 50/60Hz

50VA max

EMC

Other

Power comsumption

Conformity specification

ꢀꢀWide Wavelength Region

EN55011:1991 Group1,ClassA

EN50082-2:1995

The wide wavelength region from ultraviolet to near-infrared

(200 to 1000nm) is covered.

Safety EN61010-1:1993+A.2:1995

0 to + 40°C

+10 to + 50°C

Ambient operation temperature

Ambient strage temperature

SYSTEM CONFIGURATION

C8066 Standard Configuration

Computer

Main unit

MPM C7460

Fiber input optics

(Including C7460)

OPTICAL ATTENUATOR

C8066

C7460

Source light

Fiber input optics

ATTENUATOR CONTROL

OD2

OD0

OD1

OD3

OD4

LOCAL

POWER

RS-232C

DIMENSIONAL OUTLINE (Unit: mm)

Main Unit (weight: approx.3.0kg)

ꢀ

Fiber Input Optics (weight: approx.100g)

ꢀ

3000

OPTICAL ATTENUATOR

C8066

ATTENUATOR CONTROL

OD2

OD0

OD1

OD3

OD4

LOCAL

POWER

RS-232C

Input

to Main unit

φ 0.95

170 ±1

232 ±1

175 ±1

233 ±1

±0.5

25 ±1

ISO 9001

Certificate: 09 105 79045

ꢀ Windows is a trademark of Microsoft Corporation in the U.S.A.

ꢀ Product and software package names noted in this documentation are trademarks or registered trademarks of their respective manufacturers.

ꢀ

Subject to local technical requirements and regulations, availability of products included in this promotional material may vary. Please consult with our sales office..

Information furnished by HAMAMATSU is believed to be reliable. However, no responsibility is assumed for possible inaccuracies or omissions.

ꢀ

Specifications and external appearance are subject to change without notice.

Homepage Address http://www.hamamatsu.com

HAMAMATSU PHOTONICS K.K., Systems Division

812 Joko-cho, Hamamatsu City, 431-3196, Japan, Telephone: (81)53-431-0124, Fax: (81)53-435-1574, E-mail:export@sys.hpk.co.jp

U.S.A. and Canada: Hamamatsu Photonic Systems: 360 Foothill Road, Bridgewater, N.J. 08807-0910, U.S.A., Telephone: (1)908-231-1116, Fax: (1)908-231-0852, E-mail: usa@hamamatsu.com

Germany: Hamamatsu Photonics Deutschland GmbH: Arzbergerstr. 10, D-82211 Herrsching am Ammersee, Germany, Telephone: (49)8152-375-0, Fax: (49)8152-2658, E-mail: info@hamamatsu.de

France: Hamamatsu Photonics France S.A.R.L.: 8, Rue du Saule Trapu, Parc du Moulin de Massy, 91882 Massy Cedex, France, Telephone: (33)1 69 53 71 00, Fax: (33)1 69 53 71 10, E-mail: infos@hamamatsu.fr

United Kingdom: Hamamatsu Photonics UK Limited: 2HowardCourt,10TewinRoad,WelwynGardenCity,Hertfordshire, AL71BW, U.K., Telephone: (44) 1707-294888, Fax: (44) 1707-325777, E-mail: info@hamamatsu.co.uk

North Europe: Hamamatsu Photonics Norden AB: Smidesvägen 12, SE-171-41 Solna, Sweden, Telephone: (46)8-509-031-00, Fax: (46)8-509-031-01, E-mail: info@hamamatsu.se

Italy: Hamamatsu Photonics Italia S.R.L.: Strada della Mois, 1/E 20020 Arese (Milano), Italy, Telephone: (39)02-935 81 733, Fax: (39)02-935 81 741, E-mail: info@hamamatsu.it

Cat. No. SSIS1027E04

AUG/2002 HPK

Created in Japan (PDF)

C7460 [HAMAMATSU]

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